发明名称 マイクロエレクトロニクス組立用のポリマー組成物
摘要 <p>Embodiments according to the present invention relate to sacrificial polymer compositions that include polycarbonate polymers having repeat units derived from stereospecific polycyclic 2,3-diol monomers. The sacrificial polymer compositions also include an acid generator that is selected from at least one photoacid generator and/or at least one thermal acid generator. In addition, embodiments according to the present invention relate to a method of forming a structure that includes a three-dimensional space interposed between a substrate and an overcoat layer, and a method of temporarily bonding first and second substrates together, which make use of the polycarbonate polymers.</p>
申请公布号 JP5704495(B2) 申请公布日期 2015.04.22
申请号 JP20130524129 申请日期 2011.08.05
申请人 发明人
分类号 C08L69/00;C08K5/00;C08K5/09;C08K5/55 主分类号 C08L69/00
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