| 摘要 |
<p>The present invention relates to a barrier film, which uses an atomic layer deposition method and accordingly forms an inorganic layer on outer surface of substrate films, thereby maintaining light transmittance while having an outstanding effect of blocking moisture and gas wherein the barrier film comprises a substrate layer having flexibility; and an inorganic material layer deposited on the outer surface of the substrate layer by using the atomic layer deposition method.</p> |
