发明名称 LED with improved injection efficiency
摘要 A light emitting device and method for making the same is disclosed. The light-emitting device includes an active layer sandwiched between a p-type semiconductor layer and an n-type semiconductor layer. The active layer emits light when holes from the p-type semiconductor layer combine with electrons from the n-type semiconductor layer therein. The active layer includes a number of sub-layers and has a plurality of pits in which the side surfaces of a plurality of the sub-layers are in contact with the p-type semiconductor material such that holes from the p-type semiconductor material are injected into those sub-layers through the exposed side surfaces without passing through another sub-layer. The pits can be formed by utilizing dislocations in the n-type semiconductor layer and etching the active layer using an etching atmosphere in the same chamber used to deposit the semiconductor layers without removing the partially fabricated device.
申请公布号 US9012953(B2) 申请公布日期 2015.04.21
申请号 US201414175623 申请日期 2014.02.07
申请人 Kabushiki Kaisha Toshiba 发明人 Lester Steven;Ramer Jeff;Wu Jun;Zhang Ling
分类号 H01L33/00;H01L33/22;H01L21/02;H01L33/20;H01L33/06;H01L33/02;H01L33/32 主分类号 H01L33/00
代理机构 Hogan Lovells US LLP 代理人 Hogan Lovells US LLP
主权项 1. A light emitting device comprising: an n-type semiconductor layer, the n-type semiconductor layer including random dislocations; an active layer comprising a plurality of sub-layers on the n-type semiconductor layer, the active layer including pits of a density between 107 cm−2 and 1010 cm−2 located on the random dislocations, a plurality of the sub-layers having sidewalls that are bounded by the pits and exposed to the pits, bottoms of the pits located in the n-type semiconductor layer; a p-type semiconductor layer over the active layer, the p-type semiconductor layer extending into the pits and contacting the exposed sidewalls of the sub-layers and an upper surface of the active layer; and contact electrodes configured to apply a potential difference between the p-type semiconductor layer and the n-type semiconductor layer.
地址 Tokyo JP
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