发明名称 Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
摘要 A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap interposed therebetween. The liquid recovery system recovers the liquid on a movable object that opposes the first surface of the plate via the liquid recovery part.
申请公布号 US9013675(B2) 申请公布日期 2015.04.21
申请号 US201213364828 申请日期 2012.02.02
申请人 Nikon Corporation 发明人 Nishii Yasufumi;Nagasaka Hiroyuki;Okuyama Takeshi
分类号 G03B27/42;G03B27/52;G03F7/20 主分类号 G03B27/42
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. An immersion exposure apparatus comprising: an optical member comprising an exit surface from which light exits, the exit surface being in contact with a liquid, the liquid being disposed in at least a space between the exit surface and a movable object; a liquid contact surface facing the movable object; a liquid recovery surface surrounding the liquid contact surface and comprising a suction region via which the liquid is suctioned; a first surface facing the movable object, at least a part of the first surface being disposed between the liquid recovery surface and the movable object; a second surface being disposed between the liquid recovery surface and the first surface, at least a part of the second surface facing the liquid recovery surface; and a gap into which the liquid flows via an opening between the liquid recovery surface and the second surface, wherein the liquid recovery surface is configured to recover the liquid that flows into the gap.
地址 Tokyo JP