Avalanche photodiode-type semiconductor structure and process for producing such a structure

摘要

Avalanche diode-type semiconductor structure (1) intended to receive electromagnetic radiation in a given wavelength. The structure (1) comprises a semiconductor multiplication zone (310) including a majority carrier concentration, and delimitation means suitable for laterally delimiting the multiplication zone (310). The delimitation means comprise a semiconductor zone (410) surrounding the multiplication zone (310) and comprising a forbidden energy gap greater than the forbidden energy gap of the major part (320) of the multiplication zone (310), said zone (410) having a type of conductivity opposite that of the multiplication zone (310) with a majority carrier concentration at least 10 times greater than that of the multiplication zone (310). The invention also relates to a process for producing an avalanche photodiode-type semiconductor structure.

主权项

1. Avalanche photodiode-type semiconductor structure intended to receive electromagnetic radiation in a given wavelength and comprising:
a first semiconductor zone, called an absorption zone, with a first type of conductivity having a first face intended to receive the electromagnetic radiation and a second face opposite the first face, the semiconductor material in which said first zone is formed having a forbidden energy gap suitable for allowing electromagnetic radiation to be absorbed by said first zone, at least one second semiconductor zone, called a multiplication zone, in contact on a first longitudinal face with the second face of the first zone, the second zone having a majority carrier concentration lower than that of the first zone, and being suitable for multiplying the carriers by impact ionization, a third semiconductor zone, called a collection zone, in contact with the second semiconductor zone, said third zone having a second type of conductivity opposite the first type of conductivity and having a majority carrier concentration higher than that of the second semiconductor zone, delimitation means suitable for laterally delimiting the second zone, wherein the delimitation means comprise a fourth semiconductor zone surrounding the second zone and comprising a forbidden energy gap of energy higher than that of a major part of the second zone, said fourth zone having the first type of conductivity with a majority carrier concentration greater than that of the second zone.