发明名称 |
Self-aligned process to fabricate a memory cell array with a surrounding-gate access transistor |
摘要 |
A memory array including a plurality of memory cells. In one embodiment, each memory cell is coupled to an electrically conductive gate material. A word line is coupled to the gate material at a contact interface level. A pair of pillars is comprised of an insulating material that extends below the contact interface level. Also, a method to prevent a gate contact from electrically connecting to a source contact for a plurality of memory cells on a substrate. The method includes depositing and etching gate material to partially fill a space between the pillars and to form a word line for the memory cells, forming a pair of pillars comprised of an insulating material and depositing a gate contact between the pair of pillars such that the gate contact electrically couples the gate material at a contact interface level and the insulating material extends below the contact interface level. |
申请公布号 |
US9012970(B2) |
申请公布日期 |
2015.04.21 |
申请号 |
US201213587694 |
申请日期 |
2012.08.16 |
申请人 |
International Business Machines Corporation |
发明人 |
BrightSky Matthew J.;Lam Chung H.;Lauer Gen P. |
分类号 |
H01L29/788;H01L27/10;H01L27/24;H01L45/00 |
主分类号 |
H01L29/788 |
代理机构 |
|
代理人 |
Tuchman Ido;Alexanian Vazken |
主权项 |
1. A memory array comprising:
a plurality of memory cells, each of the memory cells electrically coupled in parallel at its respective gate contact to an electrically conductive gate material; a word line electrically coupled to the gate material at a contact interface level; and a pair of pillars, each of the pair of pillars including an electrically insulating material over a doped silicon material, wherein a first pillar of the pair of pillars is disposed on a first side of the gate contact and a second pillar of the pair of pillars is disposed on a second side of the gate contact such that the electrically insulating material extends below the contact interface level. |
地址 |
Armonk NY US |