发明名称 |
Plasma processing apparatus |
摘要 |
A plasma processing apparatus includes: a first ground member provided in processing chamber in such a way that at least a portion of the first ground member is exposed to a processing space, wherein the first ground member forms a ground potential; a second ground member provided in an exhaust space of the processing chamber to face the first ground member in such a way that at least a portion of the second ground member is exposed to the exhaust space, wherein the second ground member forms a ground potential; and a ground rod that moves up and down between the first and second ground members and contacts any one of the first or second ground member to adjust a ground state of the first or second ground member. |
申请公布号 |
US9011635(B2) |
申请公布日期 |
2015.04.21 |
申请号 |
US201213409847 |
申请日期 |
2012.03.01 |
申请人 |
Tokyo Electron Limited |
发明人 |
Hosaka Yuki;Furuya Naokazu;Ohata Mitsunori |
分类号 |
H01L21/304;C23F1/00;H01J37/32 |
主分类号 |
H01L21/304 |
代理机构 |
Cantor Colburn LLP |
代理人 |
Cantor Colburn LLP |
主权项 |
1. A plasma processing apparatus comprising:
a processing chamber in which a processing space is provided; a lower electrode provided in the processing chamber and including a holding stage on which a substrate to be processed is placed; an exhaust passage being provided between an inner wall of the processing chamber and a lateral surface of the holding stage; an exhaust plate surrounding the holding stage; an upper electrode provided in the processing chamber to face the lower electrode; a high-frequency power source which applies high-frequency power to the lower electrode; a processing gas supply mechanism which supplies a processing gas for generating plasma to the processing space; a first ground member formed of a conductive material and having a ring shape, wherein the first ground member is provided surrounding the lower electrode above the exhaust plate in such a way that at least a portion of the first ground member is exposed to the exhaust passage, and the first ground member forms a ground potential; a second ground member being provided surrounding the lower electrode below the exhaust plate and is formed of a conductive material and has a ring shape, wherein at least a portion of the second ground member is exposed to the exhaust passage, and the second ground member forms a ground potential; and a ground rod that moves up and down between the first and second ground members and contacts any one and only one of the first or second ground member to adjust a ground state of the first or second ground member. |
地址 |
JP |