Method for forming patterned doping regions

摘要

A method for forming doping regions is disclosed, including providing a substrate, forming a first-type doping material on the substrate and forming a second-type doping material on the substrate, wherein the first-type doping material is separated from the second-type doping material by a gap; forming a covering layer to cover the substrate, the first-type doping material and the second-type doping material; and performing a thermal diffusion process to diffuse the first-type doping material and the second-type doping material into the substrate.

主权项

1. A method for forming doping regions, comprising:
providing a substrate; forming a first-type doping material on the substrate, wherein the step of forming the first-type doping material on the substrate comprises providing a first mask comprising a first opening on the substrate, coating the first-type doping material on the mask and filling the first opening, performing a thermal process to convert the first-type doping material to a colloidal-state or solid-state compound, and removing the first mask; forming a second-type doping material on the substrate, wherein the first-type doping material is separated from the second-type doping material by a gap, wherein the step of forming the second-type doping material on the substrate comprises providing a second mask comprising a second opening on the substrate, coating the second-type doping material on the mask and filling the second opening, performing a thermal process to convert the second-type doping material to a colloidal-state or solid-state compound, and removing the second mask; forming a covering layer to cover the substrate, the first-type doping material, and the second-type doping material; and performing a thermal diffusion process to diffuse the first-type doping material and the second-type doping material into the substrate.