发明名称 Impedance matched to vacuum, invisible edge, diffraction suppressed mirror
摘要 Diffraction suppressed mirrors having an invisible edge are disclosed for incident light at both targeted wavelengths and broadband incident light. The mirrors have a first having at least one discontiguous portion having a plurality of nanostructured apertures. The discontiguous mirror portion impedance matches a relatively high impedance portion of the mirror to a relatively low impedance portion of the mirror, thereby reducing the diffraction edge effect otherwise present in a conventional mirror.
申请公布号 US9012008(B1) 申请公布日期 2015.04.21
申请号 US201313771815 申请日期 2013.02.20
申请人 The United States of America as represented by the Administrator of the National Aeronautics and Space Administration 发明人 Hagopian John G.;Roman Patrick A.;Shiri Sharham;Wollack Edward J.
分类号 B32B3/24;G02B5/08 主分类号 B32B3/24
代理机构 代理人
主权项 1. An impedance matched to a vacuum, invisible edge diffraction suppressed mirror, comprising: a first layer having a top surface, a bottom surface, and a thickness; a first layer contiguous portion having a periphery; and at least one first layer discontiguous portion disposed about and abutting the contiguous portion periphery, and wherein the first layer discontiguous portion comprises a plurality of nanostructures, the plurality of nanostructures defining a plurality of apertures extending from the first layer top surface, through the first layer thickness, and to the first layer bottom surface; the mirror further comprising a central portion having a clear aperture, a first zone proximate the central portion and having a first areal density of nanostructures, a second zone proximate the first zone and having a second areal density of nanostructures, and a third zone having a third areal density of nanostructures where the clear aperture defines a mirror region having high impedance and the region of non-mirror space beyond the mirror zone defines a non-mirror region having low impedance; the mirror first zone, second zone, and third zone comprising nanostructures formed from substantially circular holes extending from the top of the mirror surface to the bottom of the glass substrate, each mirror zone comprising similarly sized nanostructures defined on a zone-specific pitch and zone-specific areal coverage density.
地址 Washington DC US