| 摘要 |
<p>The present invention relates to a tray assembly for dry etching and a dry etching apparatus using the same, capable of improving the uniformity of a surface structure with regard to a processing substrate which is etched in a dry etching process. For this, the present invention provides the tray assembly for the dry etching which includes a tray body on which a substrate unit with a plurality of processing substrates is arranged and a dummy substrate which is arranged to surround the outermost processing substrates among the processing substrates and the dry etching apparatus using the same. Wherein, the dummy substrate has different widths on at least two points of the region to surround the outermost processing substrates.</p> |
