| 发明名称 | Barrier layer to SiOC alkali metals | ||
| 摘要 | The invention relates to a glazing comprising a transparent glass substrate containing ions of at least one alkali metal and a transparent layer made of silicon oxycarbide (SiOxCy) having a total thickness E with (a) a carbon-rich deep zone, extending from a depth P3 to a depth P4, where the C/Si atomic ratio is greater than or equal to 0.5, and (b) a carbon-poor surface zone, extending from a depth P1 to a depth P2, where the C/Si atomic ratio is less than or equal to 0.4, with P1<P2<P3<P4 and (P2−P1)+(P4−P3)<E;the distance between P1 and P2 representing from 10% to 70% of the total thickness E of the silicon oxycarbide layer and;the distance between P3 and P4 representing from 10% to 70% of the total thickness E of the silicon oxycarbide layer. | ||
| 申请公布号 | US9012024(B2) | 申请公布日期 | 2015.04.21 |
| 申请号 | US201214358540 | 申请日期 | 2012.11.14 |
| 申请人 | Saint-Gobain Glass France | 发明人 | Thoumazet Claire;Melcher Martin;Huignard Arnaud;Lante Raphael |
| 分类号 | B32B17/06;C23C16/22;C03C17/34;C23C16/40;C23C16/32 | 主分类号 | B32B17/06 |
| 代理机构 | Oblon, McClelland, Maier & Neustadt, L.L.P. | 代理人 | Oblon, McClelland, Maier & Neustadt, L.L.P. |
| 主权项 | 1. A glazing, comprising: a transparent glass substrate comprising ions of an alkali metal, and a transparent silicon oxycarbide layer (SiOxCy), having a total thickness E, comprising a carbon-rich deep zone, extending from a depth P3 to a depth P4, with a C/Si atomic ratio of greater than or equal to 0.5, and a carbon-poor surface zone, extending from a depth P1 to a depth P2, with a C/Si atomic ratio of less than or equal to 0.4, wherein P1<P2<P3<P4,(P2−P1)+(P4−P3)<E, a distance between P1 and P2 is from 10% to 70% of the total thickness E of the silicon oxycarbide layer, and a distance between P3 and P4 is from 10% to 70% of the total thickness E of the silicon oxycarbide layer. | ||
| 地址 | Courbevoie FR | ||