发明名称 Method for manufacturing touch screen panel
摘要 A method for manufacturing a touch screen panel includes forming first and second conductive layers on a substrate, forming a photosensitive layer on the second conductive layer, exposing the photosensitive layer using a first mask having a first light shielding pattern that corresponds to sensing electrodes and lines to be formed, removing the photosensitive layer at the first exposed portion, sequentially removing the second and first conductive layers at the first exposed portion using the first remaining photosensitive layer as a mask, exposing the photosensitive layer using a second mask having a second light shielding pattern that corresponds to the lines to be formed, removing the photosensitive layer at the second exposed portion, removing the second conductive layer at the second exposed portion using the second remaining photosensitive layer as a mask, thereby forming the sensing electrodes and the lines, and removing the second remaining photosensitive layer.
申请公布号 US9011703(B2) 申请公布日期 2015.04.21
申请号 US201313863636 申请日期 2013.04.16
申请人 Samsung Display Co., Ltd. 发明人 Baek Sang-Min
分类号 H01B13/00;G06F3/041;G06F3/044 主分类号 H01B13/00
代理机构 Lee & Morse, P.C. 代理人 Lee & Morse, P.C.
主权项 1. A method for manufacturing a touch screen panel, the method comprising: forming a first conductive layer and a second conductive layer on a substrate; forming a photosensitive layer on the second conductive layer; exposing the photosensitive layer using a first mask having a first light shielding pattern that corresponds to a position of sensing electrodes and lines to be formed, the exposing providing a first exposed portion; removing the photosensitive layer at the first exposed portion, the removing providing a first remaining photosensitive layer; sequentially removing the second and first conductive layers at the first exposed portion using the first remaining photosensitive layer as a mask; exposing the first remaining photosensitive layer using a second mask having a second light shielding pattern that corresponds to the position of the lines to be formed, the exposing providing a second exposed portion; removing the first remaining photosensitive layer at the second exposed portion, the removing providing a second remaining photosensitive layer; removing the second conductive layer at the second exposed portion using the second remaining photosensitive layer as a mask, thereby forming the sensing electrodes and the lines; and removing the second remaining photosensitive layer.
地址 Yongin, Gyunggi-Do KR