Broadband techniques to reduce the effects of impedance mismatch in plasma chambers

摘要

A plasma generator system for reducing the effects of impedance mismatch. The system has a variable frequency source having an output for emitting an RF signal. A plasma chamber has an input for receiving the RF signal. The variable frequency source modulates at least one of the frequency and phase of the RF signal to improve the system tolerance of impedance mismatches between the output of the variable frequency source and the input of the plasma chamber.

主权项

1. An RF generator system, comprising:
a variable frequency source for generating a RF signal for application to a plasma chamber, the RF signal primarily having a particular frequency; and a modulation stage controlling the variable frequency source, the modulation stage configured to generate a signal to vary a frequency modulation of the RF signal, the modulation stage varying the frequency modulation of the RF signal during operation, to vary the energy applied to the plasma about the particular frequency, the modulation stage varying the frequency modulation of the RF signal to prevent an impedance mismatch, thereby preventing the plasma from extinguishing during operation; and a RF coupling detector having an output signal that varies in accordance with the RF coupling between the output of the variable frequency source and an input to the plasma chamber.