ELECTRON BEAM EXPOSURE APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an electron beam exposure apparatus that can detect an error of an electron beam in real time in an exposure process.SOLUTION: An electron beam exposure apparatus includes: an electron beam source 20 that emits an electron beam corresponding to first input data and an electron beam corresponding to second input data; a stage 100 that has a mask 200 formed on a top surface thereof and irradiated with the electron beam on the basis of the first input data, and is configured to move the mask 200; and an error detection device 300 that detects an error regarding the electron beam emitted based on the second input data and outputs error detection information on the basis of the electron beam having the error detected.