发明名称 METHOD FOR FORMING SURFACE PLASMON BY UTILIZING MICRO CONFIGURATION
摘要 PROBLEM TO BE SOLVED: To solve the problem that it takes high costs and time since a surface plasmon is not generated unless vapor deposition is continuously performed to a metal configuration by utilizing chemical vapor deposition.SOLUTION: In a method for forming a surface plasmon by utilizing a micro configuration, a plurality of metal nanoparticles are loaded by a carrier after acquiring a substrate, and the micro configuration to be constituted of the metal nanoparticles to be selected from discontinuous surfaces and partial continuous surfaces so as to be autonomously assembled is formed on the substrate. Thus, use of a high-cost method such as chemical vapor deposition is avoided, and purposes of reduction of creation costs and shortening of creation time are achieved by making the micro configuration to be constituted of the metal nanoparticles to be selected from the discontinuous surfaces and the partial continuous surfaces so as to be autonomously assembled into the surface plasmon. Restriction existing in a conventional configuration of surface plasmon waves is broken, and a generation effect of the surface plasmon waves is improved.
申请公布号 JP2015076608(A) 申请公布日期 2015.04.20
申请号 JP20140173397 申请日期 2014.08.28
申请人 TSUNG CHENG-SHENG 发明人 TSUNG CHENG-SHENG;CHUANG SHIH-HAO
分类号 H01L33/38;H01L33/40 主分类号 H01L33/38
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