发明名称 FACILITY MONITORING DIAGNOSTIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a facility monitoring diagnostic apparatus capable of detecting a problematic operation condition and capable of accurately identifying a facility deeply related to occurrence of the condition, even when there is a mismatch from beginning in an operation stage.SOLUTION: A monitoring diagnostic apparatus for monitoring operation of a plant such as a local energy supply system having devices configured in parallel, includes: means that measures a process quantity in facility operation and an on/off state of the facility in operation to store and performs clustering by a functional unit such as water supply, cold supply, or heat exchange; and cluster classification means that determines which cluster each function of an object plant belongs to on the basis of the process quantity collected at a constant period and the facility on/off state, and a relationship between the process quantity of each functional unit and the cluster is displayed.
申请公布号 JP2015076058(A) 申请公布日期 2015.04.20
申请号 JP20130213977 申请日期 2013.10.11
申请人 HITACHI LTD 发明人 ISHII YOSHIKAZU;SHIMAKURA SATOSHI;SASAKI HIROTO;KAWABATA KAORU
分类号 G05B23/02 主分类号 G05B23/02
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