发明名称 |
IMPROVED WAYS TO GENERATE PLASMA IN CONTINUOUS POWER MODE FOR LOW PRESSURE PLASMA PROCESSES |
摘要 |
The present invention concerns a method comprising the steps of: introducing a substrate comprising a surface to be coated in a low-pressure reaction chamber; exposing said surface to a plasma during a treatment period within said reaction chamber; ensuring a stable plasma ignition by applying a power input, characterized in that the power input is continuously strictly higher than zero Watt (W) during said treatment period and comprises at least a lower limit power and at least an upper limit power strictly larger than said lower limit power, thereby obtaining a substrate with a coated surface. The present invention further concerns an apparatus for treating a substrate with a low-pressure plasma process and a substrate treated as such. |
申请公布号 |
CA2926783(A1) |
申请公布日期 |
2015.04.16 |
申请号 |
CA20142926783 |
申请日期 |
2014.10.07 |
申请人 |
EUROPLASMA NV |
发明人 |
LEGEIN, FILIP;ROGGE, EVA;SERCU, MARC |
分类号 |
B05D1/00;H01J37/32 |
主分类号 |
B05D1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|