METHODOLOGY FOR PATTERN DENSITY OPTIMIZATION

摘要

The present disclosure relates to a method of improving pattern density with a low OPC (optical proximity correction) cycle time, and an associated apparatus. In some embodiments, the method is performed by forming an integrated chip (IC) design that is a graphical representation of an integrated chip. One or more low-pattern-density areas of the IC design are identified having a pattern density that results in a processing failure. The low-pattern-density areas are a subset of the IC design. The pattern density is adjusted within the low-pattern-density area by adding one or more dummy shapes within the low-pattern-density areas. A data preparation process is then performed on the IC design to modify shapes of the one or more dummy shapes within the low-pattern-density areas. By introducing dummy shapes into a local area, rather than into an entire integrated chip design, the demands of the subsequent data preparation process are reduced.

主权项

1. A method for pattern density optimization, comprising:
forming an integrated chip (IC) design comprising a graphical representation of an integrated chip using a computation element; performing an initial data preparation process on the IC design, using a data preparation element, to generate a modified IC design having modified shapes of the IC design; identifying one or more low-pattern-density areas of the modified IC design having a pattern density that results in a processing failure after performing the initial data preparation process using a local density checking element, wherein respective low-pattern-density areas comprise a subset of the IC modified design; adjusting the pattern density of the modified IC design within the one or more low-pattern-density areas by adding one or more dummy shapes within the one or more low-pattern-density areas using a dummy shape insertion element; and performing a second data preparation process on the modified IC design that modifies shapes of the one or more dummy shapes within the one or more low-pattern-density areas using the data preparation element.