| 摘要 |
<p>The purpose of the present invention is to provide a functional film exhibiting excellent bending resistance and durability under high temperatures and high humidities. The present invention provides a functional film which includes a chemical composition represented by chemical formula (1) (in chemical formula (1): M represents at least one element selected from the group consisting of the group 13 elements in the long-form periodic table; and w, x, y, and z are respectively the elemental ratio of M to silicon, the elemental ratio of oxygen to silicon, the elemental ratio of nitrogen to silicon, and the elemental ratio of carbon to silicon, and satisfy mathematical expressions (1)-(4)). In the functional film, the ratio (I[Si-H]/I[Si-O]) of the intensity of absorption in the vicinity of 2200 cm-1 due to Si-H, to the intensity of absorption in the vicinity of 1050 cm-1 due to Si-O, said intensities being observed in the IR spectrum, is not more than 0.03.</p> |
