| 发明名称 |
MASK STORAGE DEVICE FOR MASK HAZE PREVENTION AND METHODS THEREOF |
| 摘要 |
A mask storage device for storing a mask used in lithography comprises a desiccant retainer for receiving a desiccant, the desiccant retainer comprising one or more passages. The mask storage device also comprises a first shell and a second shell, the second shell removably attached to the first shell and arranged to form a sealed space with the first shell in a closed state. The desiccant retainer is positioned in the sealed space. The mask storage device also comprises a gasket positioned between the first shell and the second shell. The gasket is configured to create a sufficiently airtight seal between the first shell and the second shell in the closed state. The one or more passages of the desiccant retainer comprise one or more membranes. |
| 申请公布号 |
US2015101939(A1) |
申请公布日期 |
2015.04.16 |
| 申请号 |
US201414573863 |
申请日期 |
2014.12.17 |
| 申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
CHANG Yung-Chih;CHANG Chih-Wing |
| 分类号 |
B65D81/26;B65D55/02;B65D85/00;B65D43/02 |
主分类号 |
B65D81/26 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A mask storage device for storing a mask used in lithography, the mask storage device comprising:
a desiccant retainer for receiving a desiccant, the desiccant retainer comprising one or more passages; a first shell and a second shell, the second shell removably attached to the first shell and arranged to form a sealed space with the first shell in a closed state, the desiccant retainer positioned in the sealed space; and a gasket positioned between the first shell and the second shell and configured to create a sufficiently airtight seal between the first shell and the second shell in the closed state, wherein the one or more passages of the desiccant retainer comprise one or more membranes. |
| 地址 |
Hsinchu TW |
