| 发明名称 |
VAPOR DEPOSITION APPARATUS |
| 摘要 |
A vapor deposition apparatus includes a substrate mount unit on which a substrate is mounted, a plurality of first nozzle units which injects a first raw material in a direction of the substrate mount unit, a plurality of second nozzle units which is alternately disposed with the plurality of first nozzle units and injects a second raw material in the direction of the substrate mount unit, and a plasma module unit which supplies the second raw material to the plurality of second nozzle units. The second raw material is a radical, and the substrate mount unit includes an electrostatic generation part. |
| 申请公布号 |
US2015101535(A1) |
申请公布日期 |
2015.04.16 |
| 申请号 |
US201414188017 |
申请日期 |
2014.02.24 |
| 申请人 |
Samsung Display Co., Ltd. |
发明人 |
Lee Sung-Yong;Key Sung-Hun;Kim In-Kyo;Jang Cheol-Min;Huh Myung-Soo |
| 分类号 |
C23C16/455;C23C16/50;C23C16/52 |
主分类号 |
C23C16/455 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A vapor deposition apparatus comprising:
a substrate mount unit on which a substrate is mounted; a plurality of first nozzle units which injects a first raw material in a direction of the substrate mount unit; a plurality of second nozzle units which is alternately disposed with the plurality of first nozzle units, injects a second raw material in the direction of the substrate mount unit; and a plasma module unit which supplies the second raw material to the plurality of second nozzle units, wherein the second raw material is a radical, and the substrate mount unit comprises an electrostatic generation part. |
| 地址 |
Yongin-City KR |
