发明名称 DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
摘要 According to the present invention, a detection device of detecting marks formed on a substrate, includes: a fist scope which emits light to a first mark among a plurality of marks, and detects the first mark by reflected light; a second scope which emits light to a second mark different from the first mark among the marks and detects the second mark by reflected light; a transmission part which transmits light emitted from the first scope to emit the light to the substrate; an optical member which has a surface which reflects light emitted from the second scope to the substrate. By relatively changing the position of light emitted from the first scope to the optical member with regard to the position of light reflected from the second scope to the surface of the optical member, changed is a distance between a position of the substrate which the light emitted from the first scope and passing through the transmission part reaches, and a position of the substrate which the light emitted from the second scope and reflected from the surface reaches.
申请公布号 KR20150041579(A) 申请公布日期 2015.04.16
申请号 KR20140130019 申请日期 2014.09.29
申请人 캐논 가부시끼가이샤 发明人 아카마츠 아키오
分类号 G03F7/20;H01L21/027;H01L21/66 主分类号 G03F7/20
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