发明名称 METHOD AND SYSTEM FOR SUBMICROMETRIC STRUCTURING OF A SUBSTRATE SURFACE
摘要 The invention relates to a method for submicrometric structuring of a surface (6) of a substrate (3) comprising steps for generating a plasma at atmospheric pressure above said surface (6); and injecting, on said surface (3), through said plasma, at least one gaseous precursor using at least one capillary (5) with a submicrometric diameter. The method can be implemented in a 3D printing system comprising a plate (2) moveable in three directions.
申请公布号 WO2015052396(A1) 申请公布日期 2015.04.16
申请号 WO2014FR52357 申请日期 2014.09.23
申请人 CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE 发明人 BELMONTE, THIERRY;AMARAL, THIAGO SILVA;GRIES, THOMAS;NOEL, CÉDRIC;CARDOSO, RODRIGO PERITO
分类号 B81C1/00;C23C14/00;C23C16/44 主分类号 B81C1/00
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