发明名称 SOLID-STATE IMAGING DEVICE, METHOD OF FORMING MICROLENS IN SOLID-STATE IMAGING DEVICE, AND ELECTRONIC APPARATUS
摘要 A solid-state imaging device comprises an imaging pixel located in a light receiving region, the imaging pixel being a component of a unit pixel that is one of a plurality of unit pixels arranged in an array direction. A phase difference detection pixel is located in the light receiving region and is a component of the unit pixel, and has a corresponding photodiode with an upper surface. A first microlens corresponds to the imaging pixel, and a second microlens corresponding to the phase difference detection pixel. The second microlens has a first bottom surface in the array direction and a second bottom surface in a direction diagonal to the array direction, the second bottom surface being closer to the upper surface of the photodiode than the first bottom surface.
申请公布号 US2015102442(A1) 申请公布日期 2015.04.16
申请号 US201314368720 申请日期 2013.02.27
申请人 Sony Corporation 发明人 Ootsuka Yoichi
分类号 H01L27/146 主分类号 H01L27/146
代理机构 代理人
主权项 1. A solid-state imaging device comprising: an imaging pixel located in a light receiving region, the imaging pixel being a component of a unit pixel, the unit pixel being one of a plurality of unit pixels arranged in an array direction; a phase difference detection pixel located in the light receiving region and being a component of the unit pixel; a photodiode corresponding to at least the phase difference detection pixel and having an upper surface; a first microlens corresponding to the imaging pixel; and a second microlens corresponding to the phase difference detection pixel, the second microlens having a first bottom surface in the array direction and a second bottom surface in a direction diagonal to the array direction, the second bottom surface being closer to the upper surface of the photodiode than the first bottom surface.
地址 Tokyo JP