发明名称 石墨烯薄膜制造方法;MANUFACTURING METHOD OF GRAPHENE FILM
摘要 一种石墨烯薄膜制造方法包括以下步骤:将一基板设置于一反应腔体,反应腔体具有一入口及一出口;提供一金属催化物于反应腔体中;通入一还原性气体至反应腔体中;升温反应腔体至一沉积温度;通入一含碳气体于反应腔体中;以及金属催化物协助含碳气体产生复数个碳原子,以沉积于基板以形成一石墨烯薄膜。本发明之石墨烯薄膜制造方法可于基板上沉积石墨烯薄膜,且具有于后端应用中无需再经过转移程序之优势。;A manufacturing method of graphene film includes the following steps: disposing a substrate in a reaction chamber, and the reaction chamber includes an inlet and an outlet; providing a metallic catalytic material in the reaction chamber; aerating a reducing gas into the reaction chamber; rising temperature of reaction chamber to a deposition temperature; aerating a carbon-containing gas into the reaction chamber; and generating a plurality of carbon atom from the carbon-containing gas under the assistance of the metallic catalytic material to deposit on the substrate to form a graphene film.The manufacturing method of graphene film is capable of depositing graphene film on the substrate. 
申请公布号 TW201514331 申请公布日期 2015.04.16
申请号 TW102137005 申请日期 2013.10.14
申请人 国立清华大学 NATIONAL TSING HUA UNIVERSITY 发明人 颜文群 YEN, WEN CHUN;阙郁伦 CHUEH, YU LUN
分类号 C23C16/32(2006.01) 主分类号 C23C16/32(2006.01)
代理机构 代理人 邱珍元刘正格
主权项
地址 新竹市光复路2段101号 TW