| 发明名称 |
POLISHING AGENT, POLISHING AGENT SET AND METHOD FOR POLISHING BASE |
| 摘要 |
<p>A polishing agent which contains water, abrasive grains containing a hydroxide of a tetravalent metal element, a polymerization product of α-glucose and a cationic polymer, and wherein the polymerization product of α-glucose has a weight average molecular weight of 20.0 × 103 or less.</p> |
| 申请公布号 |
WO2015052988(A1) |
申请公布日期 |
2015.04.16 |
| 申请号 |
WO2014JP71232 |
申请日期 |
2014.08.11 |
| 申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
IWANO TOMOHIRO;KIKKAWA CHISATO;AKUTSU TOSHIAKI;MINAMI HISATAKA |
| 分类号 |
H01L21/304;B24B37/00;C09G1/02;C09K3/14 |
主分类号 |
H01L21/304 |
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