| 摘要 |
The present invention addresses the problem of providing, even when a gas barrier layer having continuously gradient carbon and oxygen content ratios is formed under high-productivity conditions, a gas barrier film which exhibits high gas barrier properties and high bending resistance. A gas barrier film which has, on a flexible substrate, a gas barrier layer that contains silicon, oxygen and carbon as essential constituent elements, characterized in that: on a carbon/oxygen distribution curve wherein the carbon/oxygen content ratios are plotted, the distance between at least one pair of extrema adjacent to each other is 1 to 10nm; and a region such that the atomic ratios of carbon in the region are distributed within a range of 10 to 30at% is present in the gas barrier layer in an area spreading to a distance of 30nm from the substrate interface. |
