| 发明名称 |
METHOD OF PRODUCING GLASS SUBSTRATE AND GLASS SUBSTRATE |
| 摘要 |
A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD includes preparing the glass substrate and forming the first layer on the glass substrate by the low-temperature CVD. In the glass substrate after forming the first layer, an integrated value after a baseline correction in a wavenumber range of 2600 cm−1 to 3800 cm−1 in a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and the C content of the first layer is 1.64 at % or less. |
| 申请公布号 |
US2015103399(A1) |
申请公布日期 |
2015.04.16 |
| 申请号 |
US201414552053 |
申请日期 |
2014.11.24 |
| 申请人 |
Asahi Glass Company, Limited |
发明人 |
HANEKAWA Hiroshi;Aomine Nobutaka;Aoshima Yuki;Kawahara Hirotomo;Maeshige Kazunobu |
| 分类号 |
C03C17/245;G02B5/20;G02B1/11;G02B5/08 |
主分类号 |
C03C17/245 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD, the method comprising:
preparing the glass substrate; and forming the first layer on the glass substrate by the low-temperature CVD, wherein, in the glass substrate after said forming the first layer, an integrated value after a baseline correction in a wavenumber range of 2600 cm−1 to 3800 cm−1 in a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and a C content of the first layer is 1.64 at % or less. |
| 地址 |
Tokyo JP |
