SPUTTERING TARGET AND METHOD FOR PRODUCING SAME

摘要

A sputtering target which contains a hexagonal layered compound that is mainly composed of indium oxide and zinc oxide and is represented by formula In2O3(ZnO)m (wherein m is an integer of 2-7), and which also contains elemental Sn and elemental Zr. The ratio of elemental Sn relative to all metal elements in this sputtering target is more than 2,000 ppm but 20,000 ppm or less.