发明名称 DEVICE FOR THE HOMOGENEOUS WET-CHEMICAL TREATMENT OF SUBSTRATES
摘要 A device for wet-chemical treatment of substrates includes: an accommodation device for a substrate and a process medium, the substrate having a treatment side in operative connection with the process medium; a fluid guidance element, having a specified surface texture, housed in the accommodation device, the specified surface texture being configured to provide a guidance of the process medium along the specified surface texture, the specified surface texture being positioned lying opposite and at a predetermined fixed recess at a distance from the treatment side of the substrate; and the process medium being moved in the intervening space between the specified surface texture of the fluid guidance element and the treatment side of the substrate.
申请公布号 US2015104897(A1) 申请公布日期 2015.04.16
申请号 US201414513375 申请日期 2014.10.14
申请人 Hackenberg Juergen;Lingner Michael;Bauer Harald 发明人 Hackenberg Juergen;Lingner Michael;Bauer Harald
分类号 H01L31/0236;B05C3/04;B05C3/02 主分类号 H01L31/0236
代理机构 代理人
主权项 1. A device for wet-chemical treatment of a substrate, comprising: at least one accommodation device into which at least one substrate and at least one process medium are inserted, the at least one substrate having at least one treatment side in operative connection with the process medium; wherein at least one fluid guidance element having a specified surface texture is included in the at least one accommodation device, the at least one specified surface texture of the at least one fluid guidance element being configured to provide a guidance of the process medium along the specified surface texture, and the at least one specified surface texture being situated opposite to, and distanced at a predetermined fixed recess from the at least one treatment side of the at least one substrate; and wherein the process medium is moved in the intervening space between the specified surface texture of the at least one fluid guidance element and the at least one treatment side of the at least one substrate by at least one of: (i) using a flow generating device, (ii) the at least one treatment side of the at least one substrate being moved along the specified surface texture of the at least one fluid guidance element, and (iii) the specified surface texture of the at least one fluid guidance element being moved along the at least one treatment side of the at least one substrate.
地址 Sachsenheim DE