| 发明名称 |
Method for Repairing a Mask |
| 摘要 |
A method for repairing a mask is disclosed. A mask, having at least one defect need to be repaired, is received. The mask includes a transmissive mask or a reflective mask. A location and size of the defect is determined. A repair hard mask (RHM) is formed over the mask. Various configuration of the RHM are disclosed. A repairing process is performed, with the RHM over the mask, to repair the defect. |
| 申请公布号 |
US2015104733(A1) |
申请公布日期 |
2015.04.16 |
| 申请号 |
US201314052420 |
申请日期 |
2013.10.11 |
| 申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Shih Hsun Chuan;Chu Yuan-Chih |
| 分类号 |
G03F1/72 |
主分类号 |
G03F1/72 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for repairing a mask, comprising:
receiving a mask having a defect; determining location and size of the defect; forming a repair hard mask (RHM) over the mask; forming an opening in the RHM to expose the defect; and Repairing the defect with the RHM on the mask. |
| 地址 |
Hsin-Chu TW |
