| 摘要 |
<p>A method is disclosed for fabricating a heterojunction photovoltaic cell, comprising - providing a crystalline silicon substrate, - providing a thin passivation layer on a first main surface of said substrate; - performing a plasma treatment, comprising treating the thin passivation layer with a plasma, the plasma comprising hydrogen; - providing a second layer on the thin passivation layer, the second layer comprising amorphous silicon.</p> |
