发明名称 窒化物半導体ショットキダイオードの製造方法
摘要 <p>According to an embodiment, a nitride semiconductor Schottky diode includes a first layer including a first nitride semiconductor and a second layer provided on the first layer and including a second nitride semiconductor having a wider band gap than the first nitride semiconductor. The diode also includes an ohmic electrode provided on the second layer and a Schottky electrode provided on the second layer. The second layer includes a region containing an acceptor in the vicinity of the Schottky electrode between the Schottky electrode and the ohmic electrode.</p>
申请公布号 JP5701805(B2) 申请公布日期 2015.04.15
申请号 JP20120074275 申请日期 2012.03.28
申请人 发明人
分类号 H01L29/47;H01L21/22;H01L21/329;H01L29/872 主分类号 H01L29/47
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