EUV EXCITATION LIGHT SOURCE WITH A LASER BEAM SOURCE AND A BEAM GUIDING DEVICE FOR MANIPULATING THE LASER BEAM

摘要

An Extreme Ultra-Violet (EUV) excitation light source has a beam guide device for manipulating at least one laser beam is provided. The beam guide device comprises at least one beam splitter for generating at least two separated beams from at least one laser beam, at least one mirror or a lens for manipulating at least one of the separated beams, a superposition mirror for superposing the at least two separated beams, and a focusing appliance for generating a respective focus for each of the at least two separated beams. At least two focuses can be generated at one identical location or at two different locations by the beam guide device.