Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

摘要

A radiation-sensitive resin composition includes (A) a polymer that includes an acid-labile group, (B) an acid generator that generates an acid upon exposure to radiation, and (C) a polymer that includes a fluorine atom and a functional group shown by the following general formula (x), the polymer (C) having a fluorine atom content higher than that of the polymer (A).
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-A-R 1 €ƒ€ƒ€ƒ€ƒ€ƒ(x)
wherein R 1 represents an alkali-labile group, and A represents an oxygen atom (excluding an oxygen atom that is bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group), an imino group, -CO-O-*, or -SO 2 -O-* (wherein "*" indicates a bonding hand bonded to R 1 ).