| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in lithographic characteristics and pattern features and capable of reducing defects, and to provide a method for forming a resist pattern using the positive resist composition.SOLUTION: The positive resist composition includes: a base component (A) the solubility of which with an alkali developing solution is increased by an action of an acid; and an acid generator component (B) generating an acid by exposure. The base component (A) includes a resin component (A1) having a structural unit (a0-1) expressed by formula (a0-1) and a structural unit (a0-2) expressed by formula (a0-2). |
