发明名称 原料の気化供給装置
摘要 <p>A raw material vaporizing and supplying apparatus includes a carrier gas supply source, a source tank storing raw material, a flow passage supplying carrier gas to an internal upper space portion of the source tank, an automatic pressure regulating device installed on the flow passage, controlling pressure in the internal upper space portion to a set pressure, another flow passage supplying mixed gas (a mixture of raw material steam and carrier gas) from the internal upper space portion to a process chamber, a flow control system installed on this other flow passage, and automatically regulates a flow rate of the mixed gas supplied to the process chamber to a set flow rate, and a constant temperature heating unit that heats the source tank, a portion of the automatic pressure regulating device, a portion of the flow control system, the pipe passage, and the other pipe passage, to a set temperature.</p>
申请公布号 JP5703114(B2) 申请公布日期 2015.04.15
申请号 JP20110100446 申请日期 2011.04.28
申请人 发明人
分类号 H01L21/205;C23C16/448 主分类号 H01L21/205
代理机构 代理人
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