发明名称 Semiconductor cleaner systems and methods
摘要 In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10−6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.
申请公布号 US9004561(B2) 申请公布日期 2015.04.14
申请号 US201414251564 申请日期 2014.04.11
申请人 发明人 Rebstock Lutz
分类号 H01L21/687;H01L21/67;H01L21/673 主分类号 H01L21/687
代理机构 代理人
主权项 1. A method for transferring a workpiece, wherein the workpiece comprises a first component and a second component, the method comprising: handling the first component at a first portion on a handler; transferring the first component to a first destination; handling the second component at a second portion on the handler, wherein the second portion is at a different location on the handler than the first portion; transferring the second component to a second destination, wherein an insert is coupled to the handler, wherein the first portion comprises a middle portion of the insert, and wherein the second portion comprises a top and bottom portion of the insert.
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