发明名称 Cu—Ni—Si alloy for electronic material
摘要 The distribution of Ni—Si compound grains is controlled to thereby improve the properties of Corson alloys. The copper alloy for electronic materials comprises 0.4 to 6.0% mass of Ni and 0.1 to 1.4% by mass of Si, with the balance being Cu and unavoidable impurities.;The copper alloy comprising: small particles of Ni—Si compound having a particle size of equal to or greater than 0.01 μm and smaller than 0.3 μm; andlarge particles of Ni—Si compound having a particle size of equal to of greater than 0.3 μm and smaller than 1.5 μm.;The number density of the small particles is 1 to 2000 pieces/μm2 and the number density of the large particles is 0.05 to 2 pieces/μm2.
申请公布号 US9005521(B2) 申请公布日期 2015.04.14
申请号 US201013638806 申请日期 2010.04.02
申请人 JX Nippon Mining & Metals Corporation 发明人 Ookubo Mitsuhiro
分类号 C22C9/06;C22C9/10;C22F1/08;C22C1/10;C22F1/00 主分类号 C22C9/06
代理机构 Drinker Biddle & Reath LLP 代理人 Drinker Biddle & Reath LLP
主权项 1. A copper alloy for electronic materials comprising 0.4 to 6.0% by mass of Ni and 0.1 to 1.4% by mass of Si, with the balance being Cu and unavoidable impurities, the copper alloy comprising: small particles of Ni—Si compound having a particle size of equal to or greater than 0.01 μm and smaller than 0.3 μm; and large particles of Ni—Si compound having a particle size of equal to or greater than 0.3 μm and smaller than 1.5 μm; wherein the number density of the small particles is 1 to 2000 pieces/μm2 and the number density of the large particles is 0.05 to 2 pieces/μm2.
地址 Tokyo JP