发明名称 |
Cu—Ni—Si alloy for electronic material |
摘要 |
The distribution of Ni—Si compound grains is controlled to thereby improve the properties of Corson alloys. The copper alloy for electronic materials comprises 0.4 to 6.0% mass of Ni and 0.1 to 1.4% by mass of Si, with the balance being Cu and unavoidable impurities.;The copper alloy comprising:
small particles of Ni—Si compound having a particle size of equal to or greater than 0.01 μm and smaller than 0.3 μm; andlarge particles of Ni—Si compound having a particle size of equal to of greater than 0.3 μm and smaller than 1.5 μm.;The number density of the small particles is 1 to 2000 pieces/μm2 and the number density of the large particles is 0.05 to 2 pieces/μm2. |
申请公布号 |
US9005521(B2) |
申请公布日期 |
2015.04.14 |
申请号 |
US201013638806 |
申请日期 |
2010.04.02 |
申请人 |
JX Nippon Mining & Metals Corporation |
发明人 |
Ookubo Mitsuhiro |
分类号 |
C22C9/06;C22C9/10;C22F1/08;C22C1/10;C22F1/00 |
主分类号 |
C22C9/06 |
代理机构 |
Drinker Biddle & Reath LLP |
代理人 |
Drinker Biddle & Reath LLP |
主权项 |
1. A copper alloy for electronic materials comprising 0.4 to 6.0% by mass of Ni and 0.1 to 1.4% by mass of Si, with the balance being Cu and unavoidable impurities, the copper alloy comprising:
small particles of Ni—Si compound having a particle size of equal to or greater than 0.01 μm and smaller than 0.3 μm; and large particles of Ni—Si compound having a particle size of equal to or greater than 0.3 μm and smaller than 1.5 μm; wherein the number density of the small particles is 1 to 2000 pieces/μm2 and the number density of the large particles is 0.05 to 2 pieces/μm2. |
地址 |
Tokyo JP |