发明名称 Method of and apparatus for active energy assist baking
摘要 An Active Energy Assist (AEA) baking chamber includes an AEA light source assembly and a heater pedestal. The AEA baking chamber further includes a controller for controlling a power input to the AEA light source assembly and a power input to the heater pedestal. A method of forming interconnects on a substrate includes etching a substrate and wet cleaning the etched substrate. The method further includes active energy assist (AEA) baking the substrate after the wet-cleaning. The AEA baking includes placing the substrate on a heater pedestal in an AEA chamber, exposing the substrate to light having a wavelength equal to or greater than 400 nm, wherein said light is emitted by a light source and controlling the light source and the heater pedestal using a controller.
申请公布号 US9004914(B2) 申请公布日期 2015.04.14
申请号 US201313915287 申请日期 2013.06.11
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Ko Chung-Chi;Chou Chia Cheng;Lin Keng-Chu;Liou Joung-Wei;Jeng Shwang-Ming;Chen Mei-Ling
分类号 A01H5/02;H01L21/768;H01L21/3105;H01L21/70;H01L21/02 主分类号 A01H5/02
代理机构 Lowe Hauptman & Ham, LLP 代理人 Lowe Hauptman & Ham, LLP
主权项 1. An Active Energy Assist (AEA) baking chamber, said chamber comprising: an AEA light source assembly; a heater pedestal; and a controller for controlling a power input to the AEA light source assembly and a power input to the heater pedestal.
地址 TW