发明名称 |
Semiconductor light emitting element and method for manufacturing the same |
摘要 |
According to one embodiment, a semiconductor light emitting element includes a first semiconductor layer of an n-type, a second semiconductor layer of a p-type, and a light emitting unit. The first semiconductor layer includes a nitride semiconductor. The second semiconductor layer includes a nitride semiconductor. The light emitting unit is provided between the first semiconductor layer and the second semiconductor layer. The light emitting unit includes a plurality of well layers stacked alternately with a plurality of barrier layers. The well layers include a first p-side well layer most proximal to the second semiconductor layer, and a second p-side well layer second most proximal to the second semiconductor layer. A localization energy of excitons of the first p-side well layer is smaller than a localization energy of excitons of the second p-side well layer. |
申请公布号 |
US9006709(B2) |
申请公布日期 |
2015.04.14 |
申请号 |
US201414180692 |
申请日期 |
2014.02.14 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
Kimura Shigeya;Nago Hajime;Nunoue Shinya |
分类号 |
H01L29/06;H01L31/0328;H01L27/15;H01L21/00;H01L33/06;H01L33/00;H01L33/08;H01L33/32;H01L33/38 |
主分类号 |
H01L29/06 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A semiconductor light emitting element, comprising:
a first semiconductor layer of an n-type including a nitride semiconductor; a second semiconductor layer of a p-type including a nitride semiconductor; and a light emitting unit provided between the first semiconductor layer and the second semiconductor layer, the light emitting unit including a plurality of well layers stacked alternately with a plurality of barrier layers, the well layers including a first p-side well layer most proximal to the second semiconductor layer, and a second p-side well layer second most proximal to the second semiconductor layer, a localization energy of excitons of the first p-side well layer being smaller than a localization energy of excitons of the second p-side well layer. |
地址 |
Minato-ku JP |