发明名称 High voltage hybrid polymeric-ceramic dielectric capacitor
摘要 An integrated circuit includes isolation capacitors which include a silicon dioxide dielectric layer and a polymer dielectric layer over the layer of silicon dioxide. The silicon dioxide dielectric layer and the polymer dielectric layer extend across the integrated circuit. Top plates of the isolation capacitors have bond pads for wire bonds or bump bonds. Bottom plates of the isolation capacitors are connected to components of the integrated circuit. Other bond pads are connected to components in the integrated circuit through vias through the silicon dioxide dielectric layer and the polymer dielectric layer.
申请公布号 US9006074(B2) 申请公布日期 2015.04.14
申请号 US201414504938 申请日期 2014.10.02
申请人 Texas Instruments Incorporated 发明人 Bonifield Thomas Dyer;Williams Byron;Jaganathan Shrinivasan
分类号 H01L21/28;H01L49/02;H01L29/06;H01L21/768;H01L23/522 主分类号 H01L21/28
代理机构 代理人 Garner Jacqueline J.;Cimino Frank
主权项 1. A method of forming an integrated circuit, comprising the steps of: providing a substrate comprising a semiconductor; forming a plurality of transistors in said substrate; forming at least one metal level over said substrate, said metal level containing metal interconnects; forming a bottom plate of an isolation capacitor; forming a silicon dioxide dielectric layer of said isolation capacitor over said bottom plate; forming a polymer dielectric layer of said isolation capacitor over said silicon dioxide dielectric layer, said polymer dielectric layer extending across said integrated circuit; forming a via hole through said polymer dielectric layer; forming a top plate of said isolation capacitor over said polymer dielectric layer; forming a bond pad on said top plate; and forming another bond pad outside said isolation capacitor, said another bond pad being electrically coupled to an instance of said metal interconnects through a via in said via hole.
地址 Dallas TX US