发明名称 Nitride semiconductor light emitting device and method of manufacturing the same
摘要 A nitride semiconductor light emitting device includes: an uneven substrate having an uneven structure in which recesses are formed; a first nitride semiconductor layer of a first conductive type formed on the uneven structure; a first light emitting layer formed on the first nitride semiconductor layer; and a second nitride semiconductor layer of a second conductive type formed on the light emitting layer, wherein each protrusion has a bottom made of a material or composition having a thermal expansion coefficient larger than the thermal expansion coefficient of the material or composition of the first nitride semiconductor layer.
申请公布号 US9006778(B2) 申请公布日期 2015.04.14
申请号 US201213675929 申请日期 2012.11.13
申请人 Panasonic Intellectual Property Mangement Co., Ltd. 发明人 Nozaki Shinichiro;Takizawa Toshiyuki;Yamanaka Kazuhiko
分类号 H01L33/00;H01L33/22;H01S5/32;H01S5/323;H01S5/02;H01S5/40 主分类号 H01L33/00
代理机构 McDermott Will & Emery LLP 代理人 McDermott Will & Emery LLP
主权项 1. A nitride semiconductor light emitting device comprising: an uneven substrate having an uneven structure in which a recess is formed; a first nitride semiconductor layer of a first conductive type formed on the uneven structure; a first light emitting layer formed on the first nitride semiconductor layer; and a second nitride semiconductor layer of a second conductive type formed on the first light emitting layer, the second conductive type being different from the first conductive type, wherein the recess has a bottom having a heat expansion coefficient larger than a heat expansion coefficient of the first nitride semiconductor layer, the uneven substrate includes a first substrate comprising silicon, an insulating layer formed on the first substrate, and a second substrate comprising silicon formed on the insulating layer, the recess is an opening formed in the second substrate such that the bottom of the recess is part of a surface of the insulating layer, and the recess has a side surface having a plane direction different from a plane direction of a main surface of the second substrate.
地址 Osaka JP