Charged particle beam apparatus

摘要

An embodiment is to provide a technique that continuously applies a certain amount of an electron beam to a sample by selecting a beam applied to the sample from an electron beam emitted from an electron source in a scanning electron microscope. A charged particle apparatus is configured, including: a mechanism that detects the distribution of electric current strength with respect to the emitting direction of an electron beam emitted from an electron source; a functionality that predicts a fluctuation of an electric current applied to a sample by predicting the distribution of the electric current based on the detected result; a functionality that determines a position at which a beam applied to the sample is acquired based on the predicted result; and a mechanism that controls a position at which a probe beam is acquired based on the determined result.

主权项

1. A charged particle beam apparatus comprising:
a distribution detecting unit configured to measure a distribution of an amount of an electric current with respect to an emitting direction of a charged particle beam emitted from a charged particle beam emitter; a fluctuation predicting unit configured to predict a fluctuation of an electric current applied to a sample from a distribution of an electric current of the charged particle beam measured by the distribution detecting unit; a position determining unit configured to determine a position of the electric current applied to the sample based on a predicted result of the fluctuation predicting unit; and a position control unit configured to control a position at which the charged particle beam applied to the sample is acquired based on a determination made by the position determining unit.