Charged particle beam writing apparatus and charged particle beam writing method using a generated frame that surrounds a first data processing block

摘要

A charged particle beam writing apparatus includes a unit to divide a chip region into first data processing blocks, a unit to, in each block, extract a cell whose reference position is located in the block concerned from cells each including at least one figure pattern, a unit to, for each block, generate a first frame that surrounds the block concerned and the cell extracted, a unit to, for each first frame, divide the inside of the first frame concerned into mesh regions and calculate an area density of a figure pattern in each mesh, a unit to combine area densities of mesh regions which are overlapped with each other and between different first frames, a unit to calculate a dose of beam by using the area density, and a unit to write a pattern on a target workpiece by irradiating the beam of the dose calculated.

主权项

1. A charged particle beam writing apparatus comprising:
a first dividing unit configured to divide a chip region into a plurality of first data processing blocks; a cell extracting unit configured to, in each of the plurality of first data processing blocks, extract a cell whose reference position is located in a first data processing block concerned from a plurality of cells each including at least one figure pattern; a first frame generating unit configured to, for each of the plurality of first data processing blocks, generate a first frame that surrounds the first data processing block concerned and the cell extracted, wherein a portion of at least one first frame for each of the plurality of first data processing blocks overlaps with a portion of at least another first frame for another first data processing block adjacent to each of the plurality of first data processing blocks; an area density calculating unit configured to, for each first frame, divide an inside of the first frame concerned into a plurality of mesh regions, and calculate an area density of a figure pattern arranged in each of the plurality of mesh regions; an area density combining unit configured to combine an area density of one mesh region of the plurality of mesh regions of one first frame and an area density of another mesh region of the plurality of mesh regions of another first frame, where the one and the another mesh regions overlap each other and are included in plural first frames; a dose calculating unit configured to calculate a dose of a charged particle beam by using an area density combined; and a writing unit configured to write a pattern on a target workpiece by irradiating the charged particle beam such that the charged particle beam has the dose calculated.