Middle-of-the-line constructs using diffusion contact structures

摘要

An approach for providing MOL constructs using diffusion contact structures is disclosed. Embodiments include: providing a first diffusion region in a substrate; providing, via a first lithography process, a first diffusion contact structure; providing, via a second lithography process, a second diffusion contact structure; and coupling the first diffusion contact structure to the first diffusion region and the second diffusion contact structure. Embodiments include: providing a second diffusion region in the substrate; providing a diffusion gap region between the first and second diffusion regions; providing the diffusion contact structure over the diffusion gap region; and coupling, via the diffusion contact structure, the first and second diffusion regions.

主权项

1. A method comprising:
providing a first diffusion region in a substrate; providing at least one metal1 (M1) layer of the substrate; providing, via a first lithography process, a first diffusion contact structure, the first diffusion contact structure being separated from the at least one metal1 (M1) layer of the substrate; providing, via a second lithography process, a second diffusion contact structure, wherein the first and second lithography processes are performed at different times; and coupling, via a double patterning technique, the first diffusion contact structure to the first diffusion region and the second diffusion contact structure, wherein the coupling of the first diffusion contact structure to the second diffusion contact structure comprises stitching the first and second diffusion contact structures, the stitching comprising providing the first and second diffusion contact structures to include an overlapping area of the first and second diffusion contact structures, and the overlapping area, in a plan view, covers less than all of the first and less than all of the second diffusion contact structures.