发明名称 |
Photonic device structure and method of manufacture |
摘要 |
Disclosed method and apparatus embodiments provide a photonic device with optical isolation from a supporting substrate. A generally rectangular cavity in cross section is provided below an element of the photonic device and the element may be formed from a ledge of the supporting substrate which is over the cavity. |
申请公布号 |
US9005458(B2) |
申请公布日期 |
2015.04.14 |
申请号 |
US201313776836 |
申请日期 |
2013.02.26 |
申请人 |
Micron Technology, Inc. |
发明人 |
Sandhu Gurtej;Meade Roy |
分类号 |
B29D11/00;H01L21/308;G02B6/136;G02B6/12 |
主分类号 |
B29D11/00 |
代理机构 |
Dickstein Shapiro LLP |
代理人 |
Dickstein Shapiro LLP |
主权项 |
1. A method of forming a photonic structure, comprising:
etching a semiconductor substrate to create a cavity below a ledge portion of the semiconductor substrate; and forming an element of a photonic device from the ledge portion of the semiconductor substrate; and wherein the photonic device element comprises a waveguide core; wherein the method of forming the photonic structure further comprises filling the cavity with a cladding material; and wherein the cavity has a generally rectangular cross-sectional shape. |
地址 |
Boise ID US |