Substrate measurement apparatus with electron distortion unit

摘要

Provided is a fusion measurement apparatus which increases or maximizes the reliability of a measurement. The fusion measurement apparatus includes an atomic microscope for measuring a surface of a substrate at an atomic level, an electron microscope for measuring the atomic microscope and the substrate, and at least one electrode which distorts the path of a secondary electron on the substrate covered by a cantilever of the atomic microscope so that the secondary electron proceeds to an electron detector of the electron microscope.

主权项

1. A measurement apparatus comprising:
an atomic force microscope (AFM) comprising a probe scanning a surface of a substrate and a cantilever; an electron microscope comprising a body tube emitting an electron beam to the AFM and the substrate and an electron detector detecting secondary electrons generated from the substrate due to the electron beam; and at least one deflector to change a path of the secondary electrons emitted from the substrate toward the electron detector while the AFM and the substrate are being monitored by using the electron microscope.