发明名称 |
EVAPORATION SOURCE, AND VACUUM VAPOR DEPOSITION DEVICE USING THE SAME |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a linear evaporation source capable of restraining temperature drop of an end region of a crucible with a simple structure, and obtaining uniformity of film thickness, and a vacuum vapor deposition device to which the evaporation source is mounted.SOLUTION: The evaporation device has: a crucible having a vapor deposition material part for housing a vapor deposition material, and heat insulation parts provided at both ends of the vapor deposition material; heating means for heating the vapor deposition material; and a vapor emission port provided on the vapor deposition part and emitting vapor evaporated by the heating means.</p> |
申请公布号 |
JP2015067865(A) |
申请公布日期 |
2015.04.13 |
申请号 |
JP20130203467 |
申请日期 |
2013.09.30 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
TAKEI TETSUYA;MATSUURA HIROYASU;MATSUZAKI EIJI |
分类号 |
C23C14/24;H01L51/50;H05B33/10 |
主分类号 |
C23C14/24 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|