发明名称 EVAPORATION SOURCE, AND VACUUM VAPOR DEPOSITION DEVICE USING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To provide a linear evaporation source capable of restraining temperature drop of an end region of a crucible with a simple structure, and obtaining uniformity of film thickness, and a vacuum vapor deposition device to which the evaporation source is mounted.SOLUTION: The evaporation device has: a crucible having a vapor deposition material part for housing a vapor deposition material, and heat insulation parts provided at both ends of the vapor deposition material; heating means for heating the vapor deposition material; and a vapor emission port provided on the vapor deposition part and emitting vapor evaporated by the heating means.</p>
申请公布号 JP2015067865(A) 申请公布日期 2015.04.13
申请号 JP20130203467 申请日期 2013.09.30
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TAKEI TETSUYA;MATSUURA HIROYASU;MATSUZAKI EIJI
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
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