| 摘要 |
PROBLEM TO BE SOLVED: To provide a quartz glass component that copes with thinning and has improved light shielding properties and heat resistance, and to provide a method for manufacturing the quartz glass component.SOLUTION: In a quartz glass component obtained by plasma-spraying a silicon powder onto the surface of a quartz glass substrate 10 to form a film 20 thereon, the quartz glass substrate 10 is made of opaque quartz glass, the ratio of the silicon powder having a particle diameter of 100 μm or more is 3% or less, the ratio of the silicon powder having a particle diameter of 100 μm or more is 0%, the D50% particle size of the silicon powder is 25-35 μm, the average film thickness of the film 20 is 40-60 μm, and a surface roughness Ra of the quartz glass substrate 10 is 2-4 μm. |
